The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
May. 21, 2015
Samsung Display Co., Ltd., Yongin, KR;
Jung-Ha Son, Seoul, KR;
Su-Bin Bae, Gyeongsan-si, KR;
Yu-Gwang Jeong, Anyang-si, KR;
Lei Xie, Suwon-si, KR;
Yun-Jong Yeo, Seoul, KR;
Joo-Hyung Lee, Seongnam-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A method of forming a fine pattern includes providing a first metal layer on a base substrate, providing a first passivation layer on the first metal layer, providing a mask pattern on the first passivation layer, providing a partitioning wall pattern having a reverse taper shape by etching the first passivation layer, coating a composition having a block copolymer between the partitioning wall patterns adjacent each other, providing a self-aligned pattern by heating the composition, and providing a metal pattern by etching the first metal layer using the self-aligned pattern as a mask.