The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Jan. 28, 2014
Sharp Kabushiki Kaisha, Osaka, JP;
Takashi Ochi, Osaka, JP;
Shinichi Kawato, Osaka, JP;
Yuhki Kobayashi, Osaka, JP;
Manabu Niboshi, Osaka, JP;
Satoshi Inoue, Osaka, JP;
Yuto Tsukamoto, Osaka, JP;
Katsuhiro Kikuchi, Osaka, JP;
Masahiro Ichihara, Mitsuke, JP;
Eiichi Matsumoto, Mitsuke, JP;
SHARP KABUSHIKI KAISHA, Osaka-Shi, JP;
Abstract
The vapor deposition device includes a plurality of vapor deposition masks whose lengths in Y axis and X axis directions are shorter than those of a film formation target substrate. Vapor deposition masks adjacent to each other in the Y axis direction is positionally displaced in the X axis direction. In an overlapping area in which mask opening group areas adjacent to each other in the Y axis direction overlap with each other in the X axis direction, opening lengths in the Y axis direction become shorter toward the outer side of each of the mask opening group areas in the plan view.