The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2016

Filed:

Jul. 17, 2012
Applicants:

Paul Bundock, Amsterdam, NL;

Michiel Theodoor Jan DE Both, Wageningen, NL;

Franck Lhuissier, Wageningen, NL;

Inventors:

Paul Bundock, Amsterdam, NL;

Michiel Theodoor Jan De Both, Wageningen, NL;

Franck Lhuissier, Wageningen, NL;

Assignee:

KEYGENE N.V., Wageningen, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 15/82 (2006.01);
U.S. Cl.
CPC ...
C12N 15/8206 (2013.01); C12N 15/8213 (2013.01);
Abstract

Method for targeted alteration of a duplex acceptor DNA sequence in a plant cell protoplast, comprising combining the duplex acceptor DNA sequence with a donor mutagenic nucleobase, wherein the duplex acceptor DNA sequence contains a first DNA sequence and a second DNA sequence which is the complement of the first DNA sequence and wherein the donor mutagenic nucleobase comprises at least one mismatch with respect to the duplex acceptor DNA sequence to be altered, preferably with respect to the first DNA sequence, wherein the method further comprises a step of introducing the donor mutagenic nucleobase into the cell protoplasts using polyethylene glycol (PEG) mediated transformation and the use of PEG protoplast transformation for enhancing the rate of targeted mutagenesis.


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