The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Apr. 14, 2008
Jie-hyun Seong, Daejeon, KR;
Seung-heon Lee, Seoul, KR;
Young-jun Hong, Daejeon, KR;
Ji-su Kim, Daejeon, KR;
Jie-Hyun Seong, Daejeon, KR;
Seung-Heon Lee, Seoul, KR;
Young-Jun Hong, Daejeon, KR;
Ji-Su Kim, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
A method for forming fine patterns includes (S) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S) coating an elastic blanket cylinder with ink or resin; (S) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.