The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Mar. 06, 2014
Mark Hastenteufel, Heidelberg, DE;
Markus Stoll, Heidelberg, DE;
Mark Hastenteufel, Heidelberg, DE;
Markus Stoll, Heidelberg, DE;
Siemens Aktiengesellschaft, München, DE;
Abstract
A method and an apparatus for planning a treatment beam aimed at at least one target region are provided. Planning parameters having associated predetermined parameter values are for performing a treatment that is to be applied with the treatment beam. The method includes defining a first predetermined parameter value of the planning parameters that is suitable for the irradiation of a treatment region that includes at least one target region. The method also includes ascertaining, based on the first predetermined parameter value, a first probability distribution in relation to an optimizable variable that is prespecified based on deviations to be expected when carrying out the irradiation.