The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Apr. 14, 2014
Applicant:

Htc Corporation, Taoyuan, Taoyuan County, TW;

Inventors:

Wen-Chun Feng, Taoyuan, TW;

Ya-Wen Huang, Taoyuan, TW;

Fu-Chang Tseng, Taoyuan, TW;

Assignee:

HTC CORPORATION, Taoyuan, Taoyuan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/235 (2006.01);
U.S. Cl.
CPC ...
H04N 5/2355 (2013.01); H04N 5/2351 (2013.01);
Abstract

An exposure control method and an image processing system are provided. The image processing system comprises: an image sensor module, configured to provide at least two types of source images in parallel, each type of the source images has different exposure setting; a pre-processing unit, configured to determine luminance distribution of the source images on block basis, perform a first exposure control according to the luminance distribution of the two types of source images, and generate output images according to the source images in RAW image domain, and a post-processing unit, configured to determine luminance distribution of the output images, and perform a second exposure control according to the luminance distribution of the output images in normal image domain; wherein exposure settings of the image sensor module is adjusted according to the first exposure control and the second exposure control.


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