The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Sep. 24, 2012
Applicant:

Agency for Science, Technology and Research, Singapore, SG;

Inventors:

Ramakrishnan Ganesan, Singapore, SG;

Jarrett Dumond, Singapore, SG;

M. S. M. Saifullah, Singapore, SG;

Su Hui Lim, Singapore, SG;

Hazrat Hussain, Singapore, SG;

Hong Yee Low, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/283 (2006.01); C23C 18/04 (2006.01); C23C 18/06 (2006.01); C23C 18/12 (2006.01); B81C 1/00 (2006.01); B82Y 40/00 (2011.01); G03F 7/004 (2006.01); G03F 7/027 (2006.01); B82Y 10/00 (2011.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/283 (2013.01); B81C 1/0046 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C23C 18/04 (2013.01); C23C 18/06 (2013.01); C23C 18/1216 (2013.01); G03F 7/0002 (2013.01); G03F 7/0043 (2013.01); G03F 7/027 (2013.01); B81C 2201/0152 (2013.01); H01L 29/0676 (2013.01);
Abstract

There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1: wherein


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