The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Apr. 20, 2015
Headway Technologies, Inc., Milpitas, CA (US);
Yue Liu, Fremont, CA (US);
Moris Dovek, San Jose, CA (US);
Glen Garfunkel, San Jose, CA (US);
Yaguang Wei, Pleasanton, CA (US);
Yuhui Tang, Milpitas, CA (US);
Po-Kang Wang, Los Altos, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A shield structure for a PMR writer is disclosed and features a first trailing shield on a write gap, and a second (PP) trailing shield on the first trailing shield and magnetically connected to the main pole layer. From a top-down view along the down-track direction, the PPtrailing shield has various shapes to provide shape anisotropy such that following hard magnet or reverse magnet initialization, PPtrailing shield magnetic orientation has a stable three domain configuration thereby minimizing skip track erasure (STE) or improving area density capability (ADC). At least one sloped side is introduced that forms an angle >90 degrees with the PPtrailing shield backside. In other embodiments, a thinner leading shield may be used to improve STE. The PPtrailing shield may have a dome shape or a planar shape from a down-track cross-sectional view.