The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Sep. 14, 2012
Ki-yeon Yang, Seongnam-si, KR;
Woong Ko, Hwaseong-si, KR;
Jae-kwan Kim, Daejeon, KR;
Du-hyun Lee, Suwon-si, KR;
Byung-kyu Lee, Seoul, KR;
Ki-yeon Yang, Seongnam-si, KR;
Woong Ko, Hwaseong-si, KR;
Jae-kwan Kim, Daejeon, KR;
Du-hyun Lee, Suwon-si, KR;
Byung-kyu Lee, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.