The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
May. 19, 2015
Applicant:
Samsung Display Co., Ltd., Yongin, KR;
Inventors:
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41M 5/46 (2006.01); G03F 1/54 (2012.01); H01L 51/00 (2006.01); B41M 5/48 (2006.01);
U.S. Cl.
CPC ...
G03F 1/54 (2013.01); B41M 5/46 (2013.01); B41M 5/465 (2013.01); B41M 5/48 (2013.01); H01L 51/0013 (2013.01);
Abstract
An optical mask including a transmissive base substrate, a reflective pattern layer, and a photothermal conversion pattern layer. The reflective pattern layer is disposed on the transmissive base substrate. The reflective pattern layer includes reflectors. The photothermal conversion pattern layer is disposed on the transmissive base substrate among the reflectors. The photothermal conversion pattern layer includes first regions with a first light absorptivity and second regions with a second light absorptivity. The second light absorptivity is greater than the first light absorptivity. The first regions are disposed among the second regions.