The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Jun. 29, 2012
Applicants:
Chung-chieh Yu, Tucson, AZ (US);
Isao Matsubara, Tochigi, JP;
Yasuyuki Unno, Tochigi, JP;
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/45 (2006.01); G02B 21/00 (2006.01); G03H 1/00 (2006.01); G03H 1/04 (2006.01);
U.S. Cl.
CPC ...
G01N 21/453 (2013.01); G02B 21/0056 (2013.01); G03H 1/0005 (2013.01); G03H 1/0443 (2013.01); G03H 2001/005 (2013.01); G03H 2001/0452 (2013.01); G03H 2223/12 (2013.01); G03H 2223/22 (2013.01); G03H 2223/52 (2013.01); G03H 2223/55 (2013.01);
Abstract
An optical system for a holographic microscope includes: a light source configured to emit a light beam; a grating configured to split the light beam into a reference beam and an object beam; a lens unit configured to irradiate a sample by the reference and object beams split by the grating; a spatial filter including a first region for the reference beam and a second region for the object beam; and a detector configured to detect an interference pattern caused by the reference and object beams.