The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Apr. 06, 2015
Mitsubishi Electric Corporation, Tokyo, JP;
Akihiro Goto, Tokyo, JP;
Nobuyuki Sumi, Tokyo, JP;
Yoshikazu Nakano, Tokyo, JP;
Hiroyuki Teramoto, Tokyo, JP;
Mitsubishi Electric Corporation, Tokyo, JP;
Abstract
A method for forming a surface layer, the purpose thereof is to form a high erosion resistant film. The method for forming a surface layer includes: arranging a member () in a machining fluid (); and forming the surface layer including silicon by spacing a silicon electrode () from the member () at a predetermined distance, and by supplying silicon component from the silicon electrode () to the member side by applying a predetermined voltage and generating electric discharge, and an iron-based metal texture including silicon of 3 to 11 wt % is formed at a thickness of 5 to 10 μm at a portion to be treated by repetitively generating a electric discharge pulse in which a time integration value of a current value of the electric discharge pulse is in a range of 30 A·μs to 80 A·μs.