The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Jul. 07, 2011
Hiromoto Ii, Tokyo, JP;
Satoshi Ito, Tokyo, JP;
Makoto Honda, Tokyo, JP;
Kiyoshi Oishi, Tokyo, JP;
Issei Suzuki, Tokyo, JP;
Hiromoto Ii, Tokyo, JP;
Satoshi Ito, Tokyo, JP;
Makoto Honda, Tokyo, JP;
Kiyoshi Oishi, Tokyo, JP;
Issei Suzuki, Tokyo, JP;
KONICA MINOLTA HOLDINGS, INC., Tokyo, JP;
Abstract
The present invention provides a gas barrier film having high barrier properties, folding/bending resistance and smoothness and excellent cutting suitability, and also provides an organic photoelectric conversion element equipped with the gas barrier film. The gas barrier film is characterized by having a gas barrier layer unit () on a side face of at least one surface of a base material (), wherein the gas barrier layer unit () comprises a first barrier layer () formed by a chemical vapor deposition method and a second barrier layer () formed by applying a silicon compound onto the first barrier layer () to form a coating film and modifying the coating film, and wherein the second barrier layer () has an unmodified region (B) on a side facing the base material and a modified region (A) on a side facing the front layer of the film.