The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Dec. 16, 2013
Applicant:

Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;

Inventors:

Kwang Ho Shin, Uiwang-si, KR;

Eun Su Park, Uiwang-si, KR;

Dong Yoon Shin, Uiwang-si, KR;

Jong Hyuk Eun, Uiwang-si, KR;

Hae Ryong Chung, Uiwang-si, KR;

Ae Kyoung Kim, Uiwang-si, KR;

Han Saem Kang, Uiwang-si, KR;

Han Su Kim, Uiwang-si, KR;

A Ra Jo, Uiwang-si, KR;

Assignee:

SAMSUNG SDI CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); B32B 38/00 (2006.01);
U.S. Cl.
CPC ...
B32B 38/0012 (2013.01); G02B 5/3083 (2013.01); B32B 2038/0028 (2013.01); B32B 2307/42 (2013.01); B32B 2367/00 (2013.01);
Abstract

A polarizing plate, a method of preparing the same and a liquid crystal display apparatus including the same are disclosed. The polarizing plate includes a polarizer and a polyester film formed on a surface of the polarizer, wherein the polyester film has a ratio of an elongation ratio in a machine direction to an elongation ratio in a transverse direction of about 1:0.8 to about 1:1.2, an in-plane retardation (Re) of about 500 nm or less at a wavelength of 550 nm, and an out-of-plane retardation (Rth) of about 10,000 nm or less at a wavelength of 550 nm.


Find Patent Forward Citations

Loading…