The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Feb. 03, 2014
Applicants:

James M. Tour, Bellaire, TX (US);

Vera Abramova, Houston, TX (US);

Alexander Slesarev, Houston, TX (US);

Inventors:

James M. Tour, Bellaire, TX (US);

Vera Abramova, Houston, TX (US);

Alexander Slesarev, Houston, TX (US);

Assignee:

WILLIAM MARSH RICE UNIVERSITY, Houston, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 29/786 (2006.01); C01B 31/04 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 29/66 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 29/78684 (2013.01); C01B 31/0438 (2013.01); C01B 31/0484 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/32131 (2013.01); H01L 29/66742 (2013.01); H01L 29/78606 (2013.01); H01L 29/78696 (2013.01); B82Y 40/00 (2013.01);
Abstract

In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.


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