The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Feb. 12, 2014
Applicant:
Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Munich, DE;
Inventor:
Erwin Hacker, Kaufbeuren, DE;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76802 (2013.01); H01L 21/0334 (2013.01); H01L 21/31116 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A method for exposing a layer buried in a substrate via a trench having an insulated lateral wall and an insulated floor includes the steps of applying an oxide onto the substrate and anisotropic etching. Applying the oxide onto the substrate takes place at least in a region of the trench such that the oxide protrudes from an edge of the trench into the trench. The protruding oxide shields the insulated lateral wall of the trench when anisotropically etching at least the insulated floor of the trench.