The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Aug. 20, 2014
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5072 (2013.01); G03F 1/00 (2013.01); G06F 17/5081 (2013.01); G03F 1/144 (2013.01); G03F 1/36 (2013.01); G06F 17/5068 (2013.01);
Abstract
A method of decomposing a design layout for a double patterning process is provided. The method includes changing, by a computing system, a design layout of a first polygon type to a design layout of a curved polygon type; coloring the design layout of the curved polygon type; generating stitching shapes for preventing acute corners in stitching areas of the colored design layout of the curved polygon type; separating the design layout including the stitching shapes for preventing the acute corners into separated design layouts of curved polygon type according to colors; and changing the separated design layouts of the curved polygon type to design layouts of a second polygon type.