The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Apr. 05, 2013
Applicant:
Novellus Systems, Inc., Fremont, CA (US);
Inventors:
Dhritiman S. Kashyap, Bangalore, IN;
David G. Cohen, San Jose, CA (US);
Davinder Sharma, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45525 (2013.01); C23C 16/45563 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32633 (2013.01);
Abstract
An apparatus for use in semiconductor processing operations to distribute process gases across a semiconductor wafer. The apparatus may include one or more annular baffles arranged in a stack of annular baffle layers within a plenum volume of the apparatus. Each annular baffle may have a mid-diameter substantially equal to and inner diameter or outer diameter of a baffle in the annular baffle layer above it. The annular baffles may be arranged in a cascading fashion.