The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Jun. 25, 2013
Applicant:

Kaneka Corporation, Osaka, JP;

Inventors:

Mari Fujii, Shiga, JP;

Shinji Ozawa, Shiga, JP;

Tomohiro Abo, Shiga, JP;

Assignee:

KANEKA CORPORATION, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01); B29C 41/24 (2006.01); C08G 73/16 (2006.01); C08G 69/00 (2006.01); C09D 179/08 (2006.01);
U.S. Cl.
CPC ...
C08G 73/1042 (2013.01); C08G 69/00 (2013.01); C08G 73/1053 (2013.01); C08G 73/1082 (2013.01); C08G 73/16 (2013.01); C09D 179/08 (2013.01);
Abstract

The object of the present invention is to obtain the polyimide and the polyamic acid excellent in heat resistance, low thermal expansion property, and transparency and achieve low birefringence and to provide a product or a member, demanded to have high heat resistance and transparency, by using the polyimide or the polyamic acid. In particular, the object is to provide a product and a member in which the polyimide or the polyamic acid of the present invention is formed on a surface of an inorganic substance such as glass, metal, a metal oxide, or a single crystal silicon. The objects are attained by introducing a rigid structure and an alicyclic structure into a skeleton and using a monomer having a fluorene skeleton together.


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