The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Sep. 24, 2015
Satoshi Katoh, Kanagawa, JP;
Kengo Tsubaki, Kanagawa, JP;
Hiroyuki Hiratsuka, Kanagawa, JP;
Haruki Saitoh, Kanagawa, JP;
Satoshi Katoh, Kanagawa, JP;
Kengo Tsubaki, Kanagawa, JP;
Hiroyuki Hiratsuka, Kanagawa, JP;
Haruki Saitoh, Kanagawa, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A modification device includes: a plasma processing unit that performs plasma processing on a processed object such that a surface of the processed object has a predetermined water contact angle; and a cooling unit that cools the surface of the processed object at least from when the plasma processing is performed to when ink is discharged such that a surface temperature of the processed object during discharge of the ink to the processed object is a temperature at which a target water contact angle range is achieved.