The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
May. 31, 2010
Sharon M. Weiss, Franklin, TN (US);
Judson D. Ryckman, Nashville, TN (US);
Marco Liscidini, Pavia, IT;
John E. Sipe, Toronto, CA;
Sharon M. Weiss, Franklin, TN (US);
Judson D. Ryckman, Nashville, TN (US);
Marco Liscidini, Pavia, IT;
John E. Sipe, Toronto, CA;
Vanderbilt University, Nashville, TN (US);
Abstract
Provided are methods of patterning porous materials on the micro- and nanometer scale using a direct imprinting technique. The present methods of direct imprinting of porous substrates ('DIPS'), can utilize reusable stamps that may be directly applied to an underlying porous material to selectively, mechanically deform and/or crush particular regions of the porous material, creating a desired structure. The process can be performed in a matter of seconds, at room temperature or higher temperatures, and eliminates the requirement for intermediate masking materials and etching chemistries.