The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Mar. 27, 2014
Pattern forming method, method for manufacturing color filter, and color filter manufactured thereby
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Mitsuji Yoshibayashi, Shizuoka, JP;
Yasuo Sugishima, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); B29D 11/00 (2006.01); G03F 7/00 (2006.01); G02B 5/20 (2006.01); G02B 5/23 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
B29D 11/00634 (2013.01); G02B 5/201 (2013.01); G02B 5/23 (2013.01); G02F 1/133516 (2013.01); G03F 7/0007 (2013.01);
Abstract
There is provided a pattern forming method, including: forming an organic film layer on a substrate; forming a patterned photoresist mask on the organic film layer; and performing a specific dry etching process to form a pattern on the organic layer.