The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Sep. 08, 2009
Applicants:

David P. Miess, Highland, UT (US);

Andrew E. Dadson, Provo, UT (US);

Inventors:

David P. Miess, Highland, UT (US);

Andrew E. Dadson, Provo, UT (US);

Assignee:

US Synthetic Corporation, Orem, UT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24D 11/00 (2006.01); B24D 3/00 (2006.01); B24D 18/00 (2006.01); B24D 99/00 (2010.01);
U.S. Cl.
CPC ...
B24D 3/005 (2013.01); B24D 18/0009 (2013.01); B24D 18/0054 (2013.01); B24D 99/005 (2013.01);
Abstract

An exemplary method of processing a polycrystalline diamond element is disclosed. According to the method, a protective layer may be formed over only a selected portion of a polycrystalline diamond element. The polycrystalline diamond element may include a polycrystalline diamond table. At least a portion of the polycrystalline diamond element may be exposed to a leaching solution such that the leaching solution contacts an exposed surface region of the polycrystalline diamond table and at least a portion of the protective layer. The protective layer may be substantially impermeable to the leaching solution. An exemplary method of manufacturing a polycrystalline diamond element is also disclosed.


Find Patent Forward Citations

Loading…