The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Oct. 09, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Steven M. Zuniga, Soquel, CA (US);
Chih Hung Chen, Sunnyvale, CA (US);
Jay Gurusamy, Santa Clara, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/10 (2012.01); B24B 37/34 (2012.01);
U.S. Cl.
CPC ...
B24B 37/10 (2013.01); B24B 37/345 (2013.01);
Abstract
A chemical mechanical polishing system is provided. The chemical mechanical polishing system includes a platen, a load cup, a hub, a first polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup, and a second polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup the second arm rotatable independently from the hub.