The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Dec. 12, 2013
Qualcomm Incorporated, San Diego, CA (US);
Jewon Kang, San Diego, CA (US);
Ying Chen, San Diego, CA (US);
Li Zhang, San Diego, CA (US);
Marta Karczewicz, San Diego, CA (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
A device performs a disparity vector derivation process to determine a disparity vector for a current block. As part of performing the disparity vector derivation process, when either a first or a second spatial neighboring block has a disparity motion vector or an implicit disparity vector, the device converts the disparity motion vector or the implicit disparity vector to the disparity vector for the current block. The number of neighboring blocks that is checked in the disparity vector derivation process is reduced, potentially resulting in decreased complexity and memory bandwidth requirements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile