The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Dec. 29, 2014
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Ordos Yuansheng Optoelectronics Co., Ltd., Ordos, Inner Mongolia, CN;

Inventors:

Haidong Wu, Beijing, CN;

Tae Gyu Kim, Beijing, CN;

Qun Ma, Beijing, CN;

Juanjuan Bai, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 33/44 (2010.01); H01L 33/08 (2010.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
H01L 33/44 (2013.01); C23C 14/042 (2013.01); H01L 33/08 (2013.01);
Abstract

Embodiments of the disclosure provide a mask, a mask group, a manufacturing method of pixels and a pixel structure. The mask includes a shielding region and an opening region which are alternately arranged. A width of the opening region is twice of a width of one sub pixel, and a width of the shielding region between two adjacent opening regions is four times of the width of one sub pixel.


Find Patent Forward Citations

Wu, Haidong. (2016). Mask, mask group, manufacturing method of pixels and pixel structure (U.S. Patent No. 9349922). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9349922

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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