The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

May. 24, 2012
Applicants:

Wanxue Zeng, Pleasanton, CA (US);

Weimin SI, San Ramon, CA (US);

Ying Hong, Los Gatos, CA (US);

Lieping Zhong, San Jose, CA (US);

Inventors:

Wanxue Zeng, Pleasanton, CA (US);

Weimin Si, San Ramon, CA (US);

Ying Hong, Los Gatos, CA (US);

Lieping Zhong, San Jose, CA (US);

Assignee:

Western Digital (Fremont), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/187 (2006.01); G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
G11B 5/187 (2013.01); G11B 5/3163 (2013.01);
Abstract

Various embodiments described herein provide for substrate structures including uniform plating seed layers, and that provide favorable adhesion on dielectric substrate layers. According to some embodiments, a methods for forming a magnetic recording pole is provided comprising: forming an insulator layer; forming a trench in the insulator layer; forming an amorphous seed layer over the insulator layer; forming an adhesion layer over the amorphous seed layer, the adhesion layer comprising a physical vapor deposited (PVD) noble metal; forming a plating seed layer over the adhesion layer, the plating seed layer comprising chemical vapor deposited (CVD) Ru; and forming a magnetic material layer over the plating seed layer.


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