The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Aug. 12, 2013
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Masahiko Yasuda, Tokyo, JP;
Taro Sugihara, Tokyo, JP;
Assignee:
NIKO CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01); G03F 7/707 (2013.01); G03F 7/70341 (2013.01); G03F 7/70691 (2013.01); G03F 7/70975 (2013.01); G03F 9/7011 (2013.01); G03F 9/7088 (2013.01); Y10T 29/49002 (2015.01);
Abstract
An exposure apparatus exposes an object with an exposure beam. The apparatus includes first and second stages, a measurement device and a controller. The first stage mounts the object. The second stage is movable relative to the first stage. The measurement device obtains position information of an outer periphery edge of the first stage. The controller controls at least one of a position of the first stage and a position of the second stage based on the position information of the outer periphery edge so that the first and second stages do not touch each other.