The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Aug. 20, 2010
Applicants:

Michael Heumüller, Neuhof, DE;

Heike Landgraf, Bruchköbel, DE;

Michael König, Frankfurt, DE;

Inventors:

Michael Heumüller, Neuhof, DE;

Heike Landgraf, Bruchköbel, DE;

Michael König, Frankfurt, DE;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G03F 7/20 (2006.01); C23C 14/04 (2006.01); C23C 14/56 (2006.01); C23C 16/04 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); G03F 7/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01); C23C 14/042 (2013.01); C23C 14/56 (2013.01); C23C 16/042 (2013.01); C23C 16/54 (2013.01); G03F 7/707 (2013.01); H01L 21/6776 (2013.01); H01L 21/67173 (2013.01); H01L 21/67184 (2013.01); H01L 21/67236 (2013.01); H01L 21/67754 (2013.01); G03F 7/12 (2013.01);
Abstract

Mask carriers and mask alignment in vacuum deposition processes, mask handling modules, and methods for aligning a mask. A mask handling module can include a substrate carrier for carrying at least one substrate; a mask carrier for carrying at least two masks. The mask carrier can include at least two mask carrier sections each being adapted to carry a mask and a mask carrier positioning device for moving the mask carrier relative to the substrate carrier. The mask carrier sections are arranged so that the masks carried on the mask carrier sections can be positioned on the mask carrier in respective planes forming an angle with respect to each other so that only one of the at least two masks can be aligned to one of the at least one substrates.


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