The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Nov. 02, 2011
Su-bin Lee, Busan, KR;
Su-hyun Park, Gyeonggi-do, KR;
Sang-wook Lee, Gyeonggi-do, KR;
Jung-min Lee, Seoul, KR;
Byoung-har Hwang, Gyeonggi-do, KR;
Su-Bin Lee, Busan, KR;
Su-Hyun Park, Gyeonggi-do, KR;
Sang-Wook Lee, Gyeonggi-do, KR;
Jung-Min Lee, Seoul, KR;
Byoung-Har Hwang, Gyeonggi-do, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
A method of manufacturing a patterned retarder includes forming a retarder material layer by applying a retarder material to a substrate; drying the retarder material layer at a first temperature; exposing the retarder material layer to linearly-polarized UV, wherein the retarder material layer has an optical anisotropic property; and heat treating the retarder material layer at a second temperature higher than the first temperature to increase the optical anisotropic property of the retarder material layer.