The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Nov. 15, 2013
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Yasuyuki Unno, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0257 (2013.01); G01M 11/0242 (2013.01);
Abstract
A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Based on the measured positions of the spot images, a wavefront aberration of the test optical system is calculated. When the positions of the spot images are measured, at least one lenslet forming the lenslet array is shielded from light, and the spot images are measured.
Unno, Yasuyuki. (2016). Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium (U.S. Patent No. 9347853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9347853
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile