The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Jul. 17, 2013
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Chadwick B. Martin, Tucson, AZ (US);

David J. Knapp, Tucson, AZ (US);

Gregory P. Hanauska, Tucson, AZ (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/00 (2006.01); F41G 7/22 (2006.01); F41G 7/26 (2006.01); F41G 7/20 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
F41G 7/2213 (2013.01); F41G 7/20 (2013.01); F41G 7/22 (2013.01); F41G 7/2293 (2013.01); F41G 7/26 (2013.01); G02B 26/101 (2013.01); G02B 27/0025 (2013.01);
Abstract

An offset aperture two-axis gimbaled optical system comprises a two-axis gimbal and an optics assembly that is mounted on the inner gimbal and offset radially from the rotation axis of the outer gimbal. The optics assembly is suitably offset so that its optical aperture does not overlap the rotation axis of the outer gimbal and its optical aperture is symmetric about the rotation axis of the inner gimbal. In different applications, the offset aperture provides for reduced optical aberrations and improved utilization of the available packaging volume to accommodate multiple offset aperture optics assemblies.


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