The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Oct. 05, 2012
Applicant:

Ndsu Research Foundation, Fargo, ND (US);

Inventors:

Douglas L. Schulz, Fargo, ND (US);

Justin Hoey, Fargo, ND (US);

Xiangfa Wu, Fargo, ND (US);

Iskander Akhatov, West Fargo, ND (US);

Philip Boudjouk, Fargo, ND (US);

Xuliang Dai, Solon, OH (US);

Larry Pederson, West Fargo, ND (US);

Jeremiah Smith, Fargo, ND (US);

Arumugasamy Elangovan, Fargo, ND (US);

Sijin Han, Milpitas, CA (US);

Assignee:

NDSU RESEARCH FOUNDATION, Fargo, ND (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/00 (2014.01); C01B 33/021 (2006.01); D04H 1/4209 (2012.01); D04H 1/4382 (2012.01); D04H 1/728 (2012.01); D06M 11/74 (2006.01); H01M 4/134 (2010.01); H01M 4/36 (2006.01); H01M 4/38 (2006.01); H01M 4/62 (2006.01); B29D 99/00 (2010.01); D01D 5/34 (2006.01); D01F 9/14 (2006.01); D01D 5/00 (2006.01); D01F 1/10 (2006.01); B82Y 40/00 (2011.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09D 11/00 (2013.01); B29D 99/0078 (2013.01); C01B 33/021 (2013.01); D01D 5/0038 (2013.01); D01D 5/34 (2013.01); D01F 1/10 (2013.01); D01F 9/14 (2013.01); D04H 1/4209 (2013.01); D04H 1/4382 (2013.01); D04H 1/728 (2013.01); D06M 11/74 (2013.01); H01M 4/134 (2013.01); H01M 4/366 (2013.01); H01M 4/38 (2013.01); H01M 4/625 (2013.01); B82Y 40/00 (2013.01); H01L 21/02532 (2013.01); H01L 21/02603 (2013.01); H01L 21/02628 (2013.01); Y02E 60/122 (2013.01); Y02P 70/54 (2015.11); Y10S 977/895 (2013.01);
Abstract

Described herein are synthesis schemes and methods for producing silicon based nanostructures and materials, including compositions and methods for synthesis of silicon-based nanowires and composites from three-component and four-component liquid silane/polymer inks. Materials and methods for producing silicon based micro and nanofibers that can be used in a variety of applications including material composites, electronic devices, sensors, photodetectors, batteries, ultracapacitors, and photosensitive substrates, and the like.


Find Patent Forward Citations

Loading…