The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Dec. 11, 2015
Applicant:

Zhejiang Quhua Fluor-chemistry Co., Ltd., Quzhou, CN;

Inventors:

Jun Lei, Ningbo, CN;

Bo Yang, Quzhou, CN;

Yan Zhang, Quzhou, CN;

Yang Zhao, Quzhou, CN;

Huadong Zhou, Quzhou, CN;

Qiang Zhou, Quzhou, CN;

Gang Su, Quzhou, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C 17/20 (2006.01); C07C 17/00 (2006.01); C07C 17/383 (2006.01); C07C 21/18 (2006.01); C07C 17/087 (2006.01);
U.S. Cl.
CPC ...
C07C 17/20 (2013.01); C07C 17/087 (2013.01); C07C 17/204 (2013.01); C07C 17/383 (2013.01); C07C 21/18 (2013.01);
Abstract

A method for preparing 2,3,3,3-tetrafluoropropene, including: a) heating and vaporizing hydrogen fluoride and 1,1,2,3-tetrachloropropene (TCP), and introducing hydrogen fluoride and TCP to a first reactor for reaction in the presence of an A-type catalyst to yield a first product mixture including 2,3-dichloro-3,3-difluoropropene ('HCFO-1232xf'), where the mole ratio between hydrogen fluoride and TCP is between 5:1 and 60:1, the reaction temperature is between 200 and 500° C., and the space velocity is between 200 and 2000 h; b) preheating the first product mixture including HCFO-1232xf, introducing the first product mixture including HCFO-1232xf to a second reactor for reaction in the presence of a B-type catalyst to yield a second product mixture including HFO-1234yf, where the temperature of the preheated first product mixture including HCFO-1232xf is higher than the reaction temperature of the first reactor and lower than the reaction temperature of the second reactor.


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