The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Apr. 05, 2012
Jae-bum Seo, Daejeon, KR;
Chang-hun Han, Daejeon, KR;
Dae-woo Lee, Busan, KR;
Jung-tae Park, Yeosu-si, KR;
Eun-jung Choi, Jeollanam-do, KR;
Byoung-il Kang, Daejeon, KR;
Joon-sik Kim, Yeosu-si, KR;
Nam-jeong Lee, Daejeon, KR;
Sang-min Kwak, Daejeon, KR;
Joong-hoon Lee, Daejeon, KR;
Jae-Bum Seo, Daejeon, KR;
Chang-Hun Han, Daejeon, KR;
Dae-Woo Lee, Busan, KR;
Jung-Tae Park, Yeosu-si, KR;
Eun-Jung Choi, Jeollanam-do, KR;
Byoung-Il Kang, Daejeon, KR;
Joon-Sik Kim, Yeosu-si, KR;
Nam-Jeong Lee, Daejeon, KR;
Sang-Min Kwak, Daejeon, KR;
Joong-Hoon Lee, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
Provided is a method of preparing a resin composition for an optical film. The method includes forming a four-component copolymer by reacting an alkyl(meth)acrylate-based monomer, an acrylate-based monomer containing a benzene ring, and a (meth)acrylic acid monomer by using a continuous bulk polymerization method; and forming a resin composition for an optical film by removing unreacted monomer and solvent from a reaction product in a devolatilizer.