The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Feb. 25, 2015
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventor:

Kenrou Kikuchi, Yokkaichi Mie, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 27/115 (2006.01); H01L 29/06 (2006.01); H01L 23/528 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11521 (2013.01); H01L 23/5283 (2013.01); H01L 27/11519 (2013.01); H01L 27/11524 (2013.01); H01L 29/0653 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01);
Abstract

According to this embodiment, a semiconductor device includes a semiconductor substrate, element formation regions that are formed in a line-and-space pattern in a surface layer portion of the semiconductor substrate to extend in a first direction, a coupling portion that is formed in the surface layer portion of the semiconductor substrate to couple the element formation regions adjacent to each other in a second direction intersecting the first direction, a source line that is disposed in an upper layer of the semiconductor substrate through an insulating film, a source line contact, having a circular shape or an elliptical shape, that is provided to electrically connect a source region pattern and the source lines by passing through the insulating film, when a region including the coupling portion and portions of the element formation regions coupled by the coupling portion is set to the source region pattern, and a bit line contact, having a circular shape or an elliptical shape, that is provided to electrically connect the element formation regions and a wiring layer located in an upper layer by passing through the insulating film.


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