The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

May. 30, 2014
Applicants:

Konstantin V. Loiko, Austin, TX (US);

Brian A. Winstead, Bridgetown, CA;

Inventors:

Konstantin V. Loiko, Austin, TX (US);

Brian A. Winstead, Bridgetown, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 29/788 (2006.01); H01L 27/115 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28008 (2013.01); H01L 21/28273 (2013.01); H01L 27/11534 (2013.01); H01L 29/7883 (2013.01); H01L 21/28282 (2013.01); H01L 27/11573 (2013.01); H01L 29/792 (2013.01);
Abstract

A method of making a split gate non-volatile memory (NVM) includes forming a charge storage layer on the substrate, depositing a first conductive layer, and depositing a capping layer. These layers are patterned to form a control gate stack. A second conductive layer is deposited over the substrate and is patterned to leave a first portion of the second conductive layer over a portion of the control gate stack and adjacent to a first side of the control gate stack. The first portion of the second conductive layer and the control gate stack are planarized to leave a dummy select gate from the first portion of the second conductive layer, where a top surface of a remaining portion of the first conductive layer is lower relative to a top surface of the dummy select gate. The dummy select gate is replaced with a select gate including metal.


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