The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Oct. 02, 2012
David Xuan-qi Wang, Fremont, CA (US);
Mehrdad M. Moslehi, Los Altos, CA (US);
David Xuan-Qi Wang, Fremont, CA (US);
Mehrdad M. Moslehi, Los Altos, CA (US);
Solexel, Inc., Milpitas, CA (US);
Abstract
A method is provided for fabricating a semiconductor substrate by forming a porous semiconductor layer conformally on a semiconductor template and then forming a semiconductor substrate conformally on the porous semiconductor layer. An inner trench having a depth less than the thickness of the semiconductor substrate is formed on the semiconductor substrate. An outer trench providing access to the porous semiconductor layer is formed on the semiconductor substrate and is positioned between the inner trench and the edge of the semiconductor substrate. The semiconductor substrate is then released from the semiconductor template.