The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Aug. 19, 2015
Applicant:

Elemental Scientific, Inc., Omaha, NE (US);

Inventors:

Paul Field, Omaha, NE (US);

Daniel R. Wiederin, Omaha, NE (US);

Austin Schultz, Omaha, NE (US);

Assignee:

Elemental Scientific, Inc., Omaha, NE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/10 (2006.01); H01J 49/00 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/105 (2013.01); H01J 49/0031 (2013.01); H01J 49/045 (2013.01);
Abstract

A method for internal standardization of cool plasma ICP-MS using one or more enriched stable isotopes includes introducing an enriched stable isotope of a chemical species to a sample containing a non-enriched isotope of the chemical species to form a sample and standard mixture. In implementations, the enriched stable isotope is introduced via an inline syringe addition to a flow of a sample solution containing a non-enriched isotope of the chemical species to be analyzed. The method also includes introducing the sample and standard mixture to an ICP-MS under cool plasma conditions. The method also includes determining an ionization amount of the enriched stable isotope by the ICP-MS. The method further includes correlating an ionization amount of the non-enriched isotope based on the determined ionization amount of the enriched stable isotope.


Find Patent Forward Citations

Loading…