The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Oct. 30, 2013
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

TaeWoo Kim, Seoul, KR;

Lei Xie, Suwon-si, KR;

Minhyuck Kang, Seoul, KR;

Myung Im Kim, Suwon-si, KR;

Seung-won Park, Seoul, KR;

Moongyu Lee, Suwon-si, KR;

Sumi Lee, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); H01L 21/308 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01);
Abstract

A method for manufacturing a polarizer may include forming a first barrier and a second barrier on a surface of a metal layer. The method may further include providing a copolymer layer between the first barrier and the second barrier. The method may further include processing the copolymer layer to form a processed polymer layer that includes first-polymer portions and second-polymer portions that are alternately disposed. The method may further include removing the second-polymer portions from the processed polymer layer to form polymer members that are spaced from each other. The method may further include etching the metal layer, using at least the polymer members, the first barrier, and the second barrier as a mask, to form a plurality of first-type wires and a plurality of second-type wires.


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