The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Jan. 18, 2012
Applicant:

Masato Shimodaira, Osaka, JP;

Inventor:

Masato Shimodaira, Osaka, JP;

Assignee:

Keyence Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); H04N 7/18 (2013.01); G01N 2021/8874 (2013.01);
Abstract

The present invention provides a defect detection apparatus for detecting a defect even on a uniformly continuous background pattern, a method used in the apparatus, and a computer program for making a computer execute processing in the method. A defect size is set and stored, and an instruction to a first direction in which a background pattern is uniformly continuous is accepted. A reduced image reduced in the first direction using an image reduction ratio according to the defect size is generated. A filter processing is executed in the first direction for removing a defect, and the reduced image that is subjected to the filter processing is enlarged in the first direction with an image enlargement ratio corresponding to the reciprocal of the reduction ratio to generate a first enlarged image. A difference image is generated by calculating a difference between the multi-valued image and the first enlarged image.


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