The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Jan. 26, 2015
Murata Manufacturing Co., Ltd., Nagaokakyo-Shi, Kyoto-Fu, JP;
MURATA MANUFACTURING CO., LTD., Nagaokakyo-Shi, Kyoto-Fu, JP;
Abstract
An aperture array structure used in a method of measuring characteristics of a specimen by applying an electromagnetic wave to an aperture array structure on which the specimen is held, and detecting frequency characteristics of the electromagnetic wave scattered by the aperture array structure. The aperture array structure includes a first principal surface, a second principal surface opposed to the first principal surface, and a plurality of apertures extending through the aperture array structure in a direction perpendicular to the first principal surface and the second principal surface. An opening area of each aperture at the first principal surface is smaller than an opening area of each aperture at the second principal surface.