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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9340868 B1

PDFFull Text
Date of Patent:
May. 17, 2016

Filed:

Feb. 06, 2013

Sputtering device

Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Jin Ho Hwang, Osan-si, KR;

Do-Hyun Kim, Seongnam-si, KR;

Sang Won Shin, Yongin-si, KR;

Woo Song Kim, Hwaseong-si, KR;

Chang-Oh Jeong, Suwon-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., , KR;

Attorney:

Cantor Colburn LLP

Primary Examiner:

Jason M Berman

Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01); C23C 16/455 (2006.01); C23C 14/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/352 (2013.01); C23C 14/0063 (2013.01); C23C 14/35 (2013.01); C23C 16/455 (2013.01); C23C 16/45565 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01); H01J 37/3411 (2013.01); H01J 37/3417 (2013.01); H01J 37/3435 (2013.01); H01J 37/3438 (2013.01);
Abstract

A sputtering device includes: a sputtering target; a substrate supporter facing the sputtering target and upon which a substrate is disposed; an anode mask between the sputtering target and the substrate which is on the substrate supporter; and a gas distribution member between the anode mask and the sputtering target, and including a plurality of gas distribution tubes separated from each other. Each gas distribution tube includes a plurality of discharge holes defined therein and through which gas is discharged to a vacuum chamber configured to receive the sputtering device.

Find Patent Forward Citations

Hwang, Jin. (2016). Sputtering device (U.S. Patent No. 9340868). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9340868

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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