The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Feb. 27, 2015
Applicant:

Brother Kogyo Kabushiki Kaisha, Nagoya-shi, Aichi-ken, JP;

Inventors:

Tomoko Hibino, Inazawa, JP;

Katsumi Kakamu, Kuwana, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1626 (2013.01); B41J 2/14201 (2013.01); B41J 2/14209 (2013.01); B41J 2/14233 (2013.01); B41J 2/161 (2013.01); B41J 2/164 (2013.01); B41J 2/1606 (2013.01); B41J 2002/14362 (2013.01); B41J 2002/14491 (2013.01);
Abstract

There is provided a method for producing a liquid discharge apparatus including a piezoelectric actuator configured to apply pressure to liquid in pressure chambers formed in a channel forming substrate. The producing method includes: forming a stacked body of an ink separation layer, piezoelectric layers, a first electrode, and second electrodes on a base member having a part to be the channel formation substrate; forming a liquid repellent layer which covers the piezoelectric layers and the second electrodes from a side opposite to the ink separation layer; and forming the pressure chambers on the base member. The liquid repellent layer is formed to have residual stress generated in the liquid repellent layer in a state that the pressure chambers are formed, the residual stress having intensity which is smaller than intensity to bend parts of the piezoelectric actuator overlapping with the pressure chambers toward the pressure chambers by 200 nm.


Find Patent Forward Citations

Hibino, Tomoko. (2016). Method for producing liquid discharge apparatus, liquid discharge apparatus, and method for forming liquid repellent layer (U.S. Patent No. 9340025). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9340025

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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