The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Feb. 14, 2014
Applicant:

Fanuc Corporation, Yamanashi, JP;

Inventor:

Naoki Sato, Yamanashi, JP;

Assignee:

FANUC CORPORATION, Yamanashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23Q 11/08 (2006.01); B23Q 11/00 (2006.01);
U.S. Cl.
CPC ...
B23Q 11/08 (2013.01); B23Q 11/0053 (2013.01); B23Q 11/0891 (2013.01); B23Q 11/0042 (2013.01); B23Q 11/0067 (2013.01); Y02P 70/171 (2015.11); Y10T 409/30392 (2015.01); Y10T 409/304088 (2015.01);
Abstract

A machine tool has a cover structure adapted for the discharge of chips. The cover is composed of a front cover, left and right side covers, and a bottom part. The bottom part is connected to a bed through the respective lower ends of the front cover and the side covers. Further, at least a part of the bottom part includes a slope gradually inclining from the side connected to the bed toward the outer periphery. Even if the chips produced during machining adhere to members inside the cover, they are washed away by a cutting fluid and discharged into a cutting fluid supply device through a channel located farthest from the central portion of the machine tool.


Find Patent Forward Citations

Sato, Naoki. (2016). Machine tool with cover structure adapted for discharge of chips (U.S. Patent No. 9339908). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9339908

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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