The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Jan. 28, 2008
Applicants:

James E. Heider, Bowling Green, OH (US);

Michael J. Cicak, Perrysburg, OH (US);

Leo Adoline, Jr., Temperance, MI (US);

Gary T. Faykosh, Perrysburg, OH (US);

Inventors:

James E. Heider, Bowling Green, OH (US);

Michael J. Cicak, Perrysburg, OH (US);

Leo Adoline, Jr., Temperance, MI (US);

Gary T. Faykosh, Perrysburg, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B65G 49/06 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67236 (2013.01); B65G 49/066 (2013.01); C23C 14/50 (2013.01); C23C 14/566 (2013.01); H01L 21/6776 (2013.01); H01L 21/67706 (2013.01); H01L 21/67712 (2013.01); H01L 21/67721 (2013.01); H01L 21/67754 (2013.01); H01L 21/68707 (2013.01); B65G 2249/02 (2013.01);
Abstract

A system () and method for coating semiconductor material on glass sheets is performed by conveying the glass sheets vertically suspended at upper extremities thereof through a system () having a housing () including a vacuum chamber (). The glass sheets are conveyed on shuttles () through an entry load lock station () into the housing vacuum chamber (), through a heating station () and at least one deposition station () in the housing (), and to a cooling stationprior to exiting of the system through an exit load lock station (). The resultant semiconductor coated glass sheet (G) has tong marks (') formed during the coating processing.


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