The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Aug. 16, 2012
Yogisha Mallya, Bangalore, IN;
Karl Antonin Bzdusek, Madison, WI (US);
Yogisha Mallya, Bangalore, IN;
Karl Antonin Bzdusek, Madison, WI (US);
KONINKLIJKE PHILIPS N.V., Eindhoven, NL;
Abstract
Adeformation vector field (DVF) ()is computed that relatively spatially registers a first image ()and a second image (). A contour ()delineating a structure in the first image is adapted using the DVF to generate an initial contour ()for the structure in the second image. A final contour ()is received for the structure in the second image. The DVF is corrected based on the initial and final contours for the structure in the second image to generate a corrected DVF (). The correction may comprise computing an adjustment DVF ()relating the initial and final contours and combining the DVF and the adjustment DVF to generate the corrected DVF. The final contour may be received by displaying the second image overlaid with the initial contour, and receiving user adjustments of the overlaid contour with the overlaid contour updated for each received user adjustment.