The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Jul. 24, 2015
Orthogonal, Inc., Rochester, NY (US);
John Andrew DeFranco, Rochester, NY (US);
Francis Houlihan, Millington, NJ (US);
Charles Warren Wright, Fairport, NY (US);
Diane Carol Freeman, Pittsford, NY (US);
Frank Xavier Byrne, Webster, NY (US);
Douglas Robert Robello, Webster, NY (US);
Sandra Rubsam, Webster, NY (US);
Terrence Robert O'Toole, Webster, NY (US);
ORTHOGONAL, INC., Rochester, NY (US);
Abstract
A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.