The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Mar. 03, 2014
Applicant:

Coherent Lasersystems Gmbh & Co. KG, Göttingen, DE;

Inventor:

Paul Van Der Wilt, Göttingen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/268 (2006.01); G01N 21/95 (2006.01); H01L 21/66 (2006.01); G01N 21/84 (2006.01); G01N 21/88 (2006.01); G02B 21/00 (2006.01); G01N 21/47 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/4788 (2013.01); G01N 21/8422 (2013.01); G01N 21/8851 (2013.01); G02B 21/002 (2013.01); H01L 21/268 (2013.01); H01L 22/12 (2013.01); G01N 2021/8461 (2013.01); G01N 2021/8477 (2013.01); G01N 2201/10 (2013.01); H01L 21/02532 (2013.01); H01L 21/02686 (2013.01);
Abstract

A method is disclosed evaluating a silicon layer crystallized by irradiation with pulses form an excimer-laser. The crystallization produces periodic features on the crystallized layer dependent on the number of and energy density ED in the pulses to which the layer has been exposed. An area of the layer is illuminated with light. A microscope image of the illuminated area is made from light diffracted from the illuminated are by the periodic features. The microscope image includes corresponding periodic features. The ED is determined from a measure of the contrast of the periodic features in the microscope image.


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