The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Nov. 12, 2012
Applicant:

Shimadzu Corporation, Kyoto, JP;

Inventors:

Kazuteru Takahashi, Kyoto, JP;

Kiyoshi Ogawa, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/24 (2006.01); G01B 11/06 (2006.01); C23C 16/52 (2006.01); C23C 14/12 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/54 (2013.01); C23C 14/547 (2013.01); C23C 14/548 (2013.01); G01B 11/0625 (2013.01);
Abstract

To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unitfor supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition sourcefor a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention meansfor preventing the matrix substance that has flown off from the above-described vapor deposition sourcefrom adhering to the above-described light amount measurement unit.


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